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Pioneer Two 電子束光刻機(jī)：

1.       系統(tǒng)適用于2"及以下的樣片，采用熱場(chǎng)發(fā)射電子槍，加速電壓為20V~30kV。可實(shí)現(xiàn)高分辨電子束曝光，*小驗(yàn)收線寬≤8nm。
2.       系統(tǒng)中集成了高精度的激光干涉工作臺(tái)，運(yùn)動(dòng)行程為50 x 50 x 25mm，XY方向定位精度為2nm，可以實(shí)現(xiàn)精確的拼接套刻，拼接套刻精度≤50nm。
3.       系統(tǒng)兼具了高精度成像度量的功能，其成像效果和市面上中高端的熱場(chǎng)電鏡類似，放大倍數(shù)為20x ~1,000,000x。 
4.       另外，除了標(biāo)準(zhǔn)配置, 客戶還可以增加***些選配件，如選配背散射探測(cè)器、能譜儀等，進(jìn)行材料分析；選配工作臺(tái)旋轉(zhuǎn)傾斜模塊，實(shí)現(xiàn)不同角度的材料成像等。如果選擇相應(yīng)的選配件，請(qǐng)?jiān)黾酉鄳?yīng)的價(jià)格。

1. The system is suitable for the sample of 2" ａnd below, using the thermal-field emission gun, ａnd the acceleration voltage is 20V~30kV.High resolution electron beam exposure can be realized, ａnd the minimum acceptance line width is 8nm.

2. The system integrates a high-precision laser interference workbench with a motion stroke of 50 x 50 x 25mm ａnd a positioning accuracy of 2nm in XY direction, which can realize precise Mosaic nesting with a precision of 50nm.

3. The system has the function of high-precision imaging measurement, ａnd its imaging effect is similar to the high-end thermal field electron microscope on the market, with the magnification of 20x ~1,000,000x. 

4. In addition to standard configuration, customers can also add some optional accessories, such as backscatter detector ａnd energy spectrometer, for material analysis;Optional table rotation tilt module, to achieve different angles of material imaging.If you choose the appropriate accessories, please increase the corresponding price.